<?xml version='1.0' encoding='UTF-8'?><metadata xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns="http://dublincore.org/documents/dcmi-terms/"><dcterms:title>STM data: Gold Nanoreliefs on Van der Waals Surfaces of InSe Semiconductor Single Crystals Obtained by High-Resolution Scanning Tunneling Microscopy Methods</dcterms:title><dcterms:identifier>https://doi.org/10.48788/DVUA/BCG5WO</dcterms:identifier><dcterms:creator>Karbivskyy Volodymyr</dcterms:creator><dcterms:creator>Svitlana  Smolyak</dcterms:creator><dcterms:publisher>DataverseUA</dcterms:publisher><dcterms:issued>2024-10-10</dcterms:issued><dcterms:modified>2025-03-20T19:56:47Z</dcterms:modified><dcterms:description>The mechanisms of gold nanorelief formation on the van der Waals surfaces of semiconductor single crystals were investigated using high-resolution scanning tunneling microscopy methods. Vacuum thermal deposition of Au (without sample cooling and inert gases) on the InSe (0001) surface.
The volt-ampere characteristics of the tunneling spectra of metallic nanostructures were obtained using a JSPM-4610 tunneling microscope. Electrons with different energies (from the conduction band, valence band, and localized states) participated in the tunneling process. Obtained with the help of a scanning microscope, the I-V characteristics of the tunnel contact with the surface of an arbitrary point make it possible to study the local electrical properties.</dcterms:description><dcterms:subject>Physics</dcterms:subject><dcterms:subject>Monolayers</dcterms:subject><dcterms:subject>Single-crystals</dcterms:subject><dcterms:subject>Scanning tunnelling microscopy</dcterms:subject><dcterms:isReferencedBy>L. І. Karbivska, V. L. Karbivskii, V. A. Artemyuk, Z. D. Kovalyuk, О. Ya. Kuznetsova, S. S. Smolyak, A. I. Sobolev, and V. V. Stonis, Nanorelief of Cu and Au Layers after Their Thermal Deposition on the InSe and GaSe Single Crystals Surfaces, Metallofiz. Noveishie Tekhnol., 41, No.3: 297–311 (2019) ttps://doi.org/10.15407/mfint.41.03.0297, doi, 10.15407/mfint.41.03.0297., https://doi.org/10.15407/mfint.41.03.0297</dcterms:isReferencedBy><dcterms:date>2024-10-10</dcterms:date><dcterms:contributor>Smolyak, Svitlana</dcterms:contributor><dcterms:dateSubmitted>2024-09-03</dcterms:dateSubmitted><dcterms:temporal>2011-04-08</dcterms:temporal><dcterms:temporal>2011-04-08</dcterms:temporal><dcterms:license>CC0 1.0</dcterms:license></metadata>