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Part 1: Document Description
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Citation |
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Title: |
TEM and SAED study of discontinuous metal-insulator multilayer systems Fe-SiO2 |
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Identification Number: |
doi:10.48788/DVUA/DNCEEM |
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Distributor: |
DataverseUA |
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Date of Distribution: |
2026-03-06 |
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Version: |
1 |
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Bibliographic Citation: |
Pazukha, Iryna; Shkurdoda, Yurii; Pylypenko, Oleksandr; Komanický, Vladimír, 2026, "TEM and SAED study of discontinuous metal-insulator multilayer systems Fe-SiO2", https://doi.org/10.48788/DVUA/DNCEEM, DataverseUA, V1 |
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Citation |
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Title: |
TEM and SAED study of discontinuous metal-insulator multilayer systems Fe-SiO2 |
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Identification Number: |
doi:10.48788/DVUA/DNCEEM |
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Authoring Entity: |
Pazukha, Iryna (Sumy State University) |
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Shkurdoda, Yurii (Sumy State Universuty) |
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Pylypenko, Oleksandr (Sumy State University) |
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Komanický, Vladimír (P.J. Šafárik University in Košice) |
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Software used in Production: |
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Grant Number: |
0224U033036 |
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Grant Number: |
0124U003644 |
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Grant Number: |
G6131 |
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Distributor: |
DataverseUA |
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Access Authority: |
Pazukha, Iryna |
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Depositor: |
Pazukha, Iryna |
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Date of Deposit: |
2026-03-06 |
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Holdings Information: |
https://doi.org/10.48788/DVUA/DNCEEM |
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Study Scope |
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Keywords: |
Physics, crystal structure, transmission electron microscopy, discontinious metal-insulator multilayers |
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Abstract: |
The impact of annealing temperature on crystal structure and microstructure of discontinuous meal-insulator multilayers [Fe/SiO2]10/S was studied by the Selected Area Electron Diffraction (SAED) technique and Transmission Electron Microscopy (TEM) |
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Kind of Data: |
TEM images |
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Kind of Data: |
SAED |
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Notes: |
A Transmission Electron Microscope (TEM) JEOL 2100F UHR operated at 200kV with a Field Emission Gun (FEG) was used to study the microstructure of discontinuous Fe-SiO2 metal-insulator multilayers. Image characterization was done in scanning/transmission mode employing a bright-field detector. Phase identification was confirmed using Selected Area Electron Diffraction (SAED). The discontinuous multilayer systems [Fe(dFe)/SiO2(3)]n/Sub, where n = 10 is the number of bilayer repeaters, were prepared by sequential magnetron sputtering on the copper mush with a carbon layer. The deposited films were annealed at different temperatures (200 and 400 С) in an Ar+N2(2%) environment using an annealing furnace with a continuous gas flow. |
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Methodology and Processing |
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Sources Statement |
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Data Access |
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Other Study Description Materials |
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Related Publications |
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Citation |
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Title: |
Pylypenko, O., Pazukha, I., Shkurdoda, Y. et al. Heat Treatment Effect on Magnetic and Electrical Transport Properties of [Fe/SiO2]n Discontinuous Multilayers. J Supercond Nov Magn 38, 199 (2025). |
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Bibliographic Citation: |
Pylypenko, O., Pazukha, I., Shkurdoda, Y. et al. Heat Treatment Effect on Magnetic and Electrical Transport Properties of [Fe/SiO2]n Discontinuous Multilayers. J Supercond Nov Magn 38, 199 (2025). |
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Label: |
diff_[Fe(3)SiO2(3)]10 after annealing at 200 C-1.jpg |
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Notes: |
image/jpeg |
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Label: |
diff_[Fe(3)SiO2(3)]10 after annealing at 200 C.jpg |
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image/jpeg |
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diff_[Fe(3)SiO2(3)]10 after deposition.jpg |
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image/jpeg |
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diff_[Fe(5)SiO2(3)]10 after annealin at 200 C.jpg |
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Notes: |
image/jpeg |
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Label: |
diff_[Fe(5)SiO2(3)]10 after annealing at 400 C.jpg |
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Notes: |
image/jpeg |
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Label: |
diff_[Fe(5)SiO2(3)]10 after deposition.jpg |
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Notes: |
image/jpeg |
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Label: |
TEM image_[Fe(3)_SiO2(3)]10 after annealin at 400 C.jpg |
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TEM image_[Fe(3)/SiO2(3)]10 after annealing at 400 C |
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Notes: |
image/jpeg |
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Label: |
TEM image_[Fe(3)_SiO2(3)]10 after annealing at 200 C.jpg |
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Text: |
TEM image_[Fe(3)_SiO2(3)]10 after annealing at 200 C |
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Notes: |
image/jpeg |
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Label: |
TEM image_[Fe(3)_SiO2(3)]10 after depesition.jpg |
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Text: |
TEM image_[Fe(3)/SiO2(3)]10 after depesition |
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Notes: |
image/jpeg |
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Label: |
TEM image_[Fe(5)_SiO2(3)]10 after annealing at 200 C-1.jpg |
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Notes: |
image/jpeg |
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Label: |
TEM image_[Fe(5)_SiO2(3)]10 after annealing at 200 C.jpg |
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Text: |
TEM image_[Fe(5)/SiO2(3)]10 after annealing at 200 C |
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Notes: |
image/jpeg |
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Label: |
TEM image_[Fe(5)_SiO2(3)]10 after annealing at 400 C.jpg |
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Text: |
TEM image_[Fe(5)/SiO2(3)]10 after annealing at 400 C |
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Notes: |
image/jpeg |
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Label: |
TEM image_[Fe(5)_SiO2(3)]10 after depesition.jpg |
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Text: |
TEM image_[Fe(5)/SiO2(3)]10 after depesition |
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Notes: |
image/jpeg |