<resource xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns="http://datacite.org/schema/kernel-4" xsi:schemaLocation="http://datacite.org/schema/kernel-4 http://schema.datacite.org/meta/kernel-4.1/metadata.xsd"><identifier identifierType="DOI">10.48788/DVUA/DNCEEM</identifier><creators><creator><creatorName nameType="Personal">Pazukha, Iryna</creatorName><givenName>Iryna</givenName><familyName>Pazukha</familyName><nameIdentifier nameIdentifierScheme="ORCID">0000-0001-9410-3024</nameIdentifier><affiliation>Sumy State University</affiliation></creator><creator><creatorName nameType="Personal">Shkurdoda, Yurii</creatorName><givenName>Yurii</givenName><familyName>Shkurdoda</familyName><nameIdentifier nameIdentifierScheme="ORCID">0000-0002-8180-4574</nameIdentifier><affiliation>Sumy State Universuty</affiliation></creator><creator><creatorName nameType="Personal">Pylypenko, Oleksandr</creatorName><givenName>Oleksandr</givenName><familyName>Pylypenko</familyName><nameIdentifier nameIdentifierScheme="ORCID">0000-0003-0289-1292</nameIdentifier><affiliation>Sumy State University</affiliation></creator><creator><creatorName nameType="Personal">Komanický, Vladimír</creatorName><givenName>Vladimír</givenName><familyName>Komanický</familyName><nameIdentifier nameIdentifierScheme="ORCID">0000-0001-8649-1987</nameIdentifier><affiliation>P.J. Šafárik University in Košice</affiliation></creator></creators><titles><title>TEM and SAED study of discontinuous metal-insulator multilayer systems Fe-SiO2</title></titles><publisher>DataverseUA</publisher><publicationYear>2026</publicationYear><subjects><subject>Physics</subject><subject>crystal structure</subject><subject>transmission electron microscopy</subject><subject>discontinious metal-insulator multilayers</subject></subjects><contributors><contributor contributorType="ContactPerson"><contributorName nameType="Personal">Pazukha, Iryna</contributorName><givenName>Iryna</givenName><familyName>Pazukha</familyName><affiliation>Sumy State University</affiliation></contributor></contributors><dates><date dateType="Submitted">2026-03-06</date><date dateType="Updated">2026-03-18</date></dates><resourceType resourceTypeGeneral="Dataset">TEM images</resourceType><relatedIdentifiers><relatedIdentifier relationType="IsCitedBy" relatedIdentifierType="URL">https://doi.org/10.1007/s10948-025-07037-z</relatedIdentifier></relatedIdentifiers><sizes><size>3815828</size><size>463743</size><size>480672</size><size>4313796</size><size>4313796</size><size>4085699</size><size>430750</size><size>216447</size><size>203928</size><size>212032</size><size>242137</size><size>293261</size><size>240034</size></sizes><formats><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format><format>image/jpeg</format></formats><version>1.1</version><rightsList><rights rightsURI="info:eu-repo/semantics/openAccess"/><rights rightsURI="http://creativecommons.org/publicdomain/zero/1.0">CC0 1.0</rights></rightsList><descriptions><description descriptionType="Abstract">The impact of annealing temperature on crystal structure and microstructure of discontinuous meal-insulator multilayers [Fe/SiO2]10/S was studied by the Selected Area Electron Diffraction (SAED) technique and Transmission Electron Microscopy (TEM)</description><description descriptionType="Other">A Transmission Electron Microscope (TEM) JEOL 2100F UHR operated at 200kV with a Field Emission Gun (FEG) was used to study the microstructure of discontinuous Fe-SiO2 metal-insulator multilayers. Image characterization was done in scanning/transmission mode employing a bright-field detector. Phase identification was confirmed using Selected Area Electron Diffraction (SAED). The discontinuous multilayer systems [Fe(dFe)/SiO2(3)]n/Sub, where n = 10 is the number of bilayer repeaters, were prepared by sequential magnetron sputtering on the copper mush with a carbon layer. The deposited films were annealed at different temperatures (200 and 400 С) in an Ar+N2(2%) environment using an annealing furnace with a continuous gas flow.</description></descriptions><geoLocations/><fundingReferences><fundingReference><funderName>The State Programs of the Ministry of Education and Science of Ukraine</funderName><awardNumber>0224U033036</awardNumber></fundingReference><fundingReference><funderName>The State Programs of the Ministry of Education and Science of Ukraine</funderName><awardNumber>0124U003644</awardNumber></fundingReference><fundingReference><funderName>NATO Program "Science for Peace and Security"</funderName><awardNumber>G6131</awardNumber></fundingReference></fundingReferences></resource>